The cleanroom is an indispensable element in semiconductor manufacturing. It is said that the presence of airborne molecular contamination (AMC), which refers to chemical substances within the cleanroom, significantly affects the manufacturing yield. At International Green Technology, we will continue to support semiconductor manufacturing worldwide by providing our chemical filter, SolaCiel™, which effectively removes AMC.
Clean Solutions
Filtering
Airbone
Molecular
Contamination
Clean Solutions
Filtering
Airbone
Molecular
Contamination
Placement of filters in the cleanroom
Air Filters Products
Chemical filter with honeycomb structure media. Specifications suitable for external air handling units (AHU). Effectively removes organic and acidic gases, with low pressure drop and minimal dust emission. The special honeycomb structure is achieved through the molding process of high-content activated carbon powder material, resulting in a unique honeycomb-shaped configuration.
Chemical filter with granular activated carbon media. Specifications suitable for external air handling units (AHU). Effectively removes organic and acidic gases with low pressure drop. The tray-type universal structure used in this filter makes it easy to replace.
Chemical filter with pleated media. Specifications suitable for semiconductor and electronic device manufacturing equipment. Effectively removes low concentrations of organic gases, acidic gases, and alkaline gases. The special structure of this filter involves bonding activated carbon and ion exchange materials between non-woven fabrics.
Chemical filter with continuous porous media. Specifications suitable for Fan Filter Units (FFU). Effectively removes organic gases, acidic gases, and alkaline gases with low pressure drop. Can be stacked to match your specific usage environment. Features a special structure that bonds activated carbon and ion exchangers onto polyurethane foam.
Product Correspondence Table
| Application | Model | For gazes | ||
| Organic | Acid | Alkaline | ||
| Semiconductor Manufacturing Equipment |  | ✓ | ✓ | ✓ |
| FFU Cleanroom | | ✓ | ✓ | |
| Outdoor Air Conditioning Unit（AHU) |  | ✓ | ✓ | |
Case study
| Gaz | Material | Problem |
| TMS, IPA, PGMEA, TOLUENE, N-DECANE, HMDS | Contamination of wafers Contamination of lenses |
| Acids | SO2, H3PO4, CH3COOH | Corrosion of metal wiring Contamination of wafers Contamination of lenses |
Bases | NH3, NMP, TMA, Morpholine | Contamination of wafers Contamination of lenses |
| Others | H2S | Corrosion of metal wiring |