The cleanroom is an indispensable element in semiconductor manufacturing.
It is said that the presence of airborne molecular contamination (AMC), which refers to chemical substances within the cleanroom,
significantly affects the manufacturing yield.
At International Green Technology, we will continue to support semiconductor manufacturing worldwide by
providing our chemical filter, Sola Ciel™, which effectively removes AMC.
Clean Solutions
Filtering
Airbone
Molecular
Contamination
Clean Solutions
Filtering
Airbone
Molecular
Contamination
Sola Ciel™
Air Filters Products
Sola Ciel Bee
・Chemical filter with honeycomb structure media ・Designed for external air handling units (AHU) ・Efficient removal of organic and acidic gases ・Low pressure drop, Low dust emission ・Unique honeycomb structure formed by molding high-content activated carbon powder
Sola Ciel Tray
・Chemical filter with granular activated carbon media ・Designed for external air handling units (AHU) ・Efficient removal of organic and acidic gases ・Low pressure drop ・Tray-type universal structure for easy replacement
Sola Ciel Pleat
・Chemical filter with pleated media ・Designed for semiconductor and electronic device manufacturing equipment ・Removes low concentrations of organic, acidic, and alkaline gases ・Special structure with activated carbon and ion exchange materials bonded between non-woven fabrics
Sola Ciel Mat
・Chemical filter with continuous porous media ・Designed for Fan Filter Units (FFU) ・Removes organic, acidic, and alkaline gases ・Low pressure drop ・Stackable design for flexible configurations ・Polyurethane foam structure bonded with activated carbon and ion exchangers
Product Correspondence Table
| Application | Model | For gases | ||
| Organic | Acid | Alkaline | ||
| Semiconductor Manufacturing Equipment |  | ✓ | ✓ | ✓ |
| FFU Cleanroom |  | ✓ | ✓ | ✓ |
| Outdoor Air Conditioning Unit（AHU) |  | ✓ | ✓ | ✓ |
Case study
| Gaz | Material | Problem |
| Condensable Volatiles | TMS, IPA, PGMEA, TOLUENE, N-DECANE, HMDS | Contamination of wafers Contamination of lenses |
| Acids | SO2, H3PO4, CH3COOH | Corrosion of metal wiring Contamination of wafers Contamination of lenses |
| Bases Amine | NH3, NMP, TMA, Morpholine | Contamination of wafers Contamination of lenses |
| Others | H2S | Corrosion of metal wiring |